Studies on Cockcroft-Walton Accelerator for Narrow E-Beam Lithography

YIN Ming; SUN Xiao-Jun

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《中国物理C》（英文）编辑部

2024年10月30日

Chinese Physics C> 2004, Vol. 28> Issue(3) : 304-307

Studies on Cockcroft-Walton Accelerator for Narrow E-Beam Lithography

YIN Ming ^, ,
SUN Xiao-Jun

E-Beam Laboratory of Shandong University,Ji′nan 250061,China

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Abstract：
For the use of narrow E-beam lithography, the Cockcroft-Walton accelerator is often required. Electrons from the gun will be accelerated by a high voltage and reached a target via electric focusing lenses and bends. To have a high quality narrow E-beam, the noise suppression for the accelerating voltage is one of the key issues. It is verified by our experiments on SDS-3 e-beam lithography machine. The system supplies analog current to the accelerator's tuning circuit, which is proportional to the input voltage. The compensation amplifier consists of main amplifier and an auxiliary one. The auxiliary amplifier reduces input offset drift on output of the main one. The general design project of a combined regulation type for the Cockcroft-Walton accelerator was described. The key technical measures for obtaining a high accelerating stability were introduced. By filtering the noise from the final output of the machine, an output voltage with high stability was obtained, and hence the pattern quality and the line resolution of the mask were improved.

References

[1]

.WANG Shu-Hong,WANG Jiu-Qing,YE Qiang.HEP NP,2002,26( 12):1302(in Chinese)(王书鸿,王九庆,叶强.高能物理与核物理,2002,26(12):1302)2.Pfeiffer H C.Vac.Sci.Technol.,1999,B17(11-12):25663.Eigler D M,Schweizer E K.Nature,1990,344:5244.WANG Jun..Hua,SHEN Lian-Guan,WANG Gui-Cheng.HEP NP,2001,25(11):1120(in Chinese)(王筠华,沈连官,王贵诚.高能物理与核物理,2002,25(11):1120)5.ZHANG Yong-Hui,CHEN Hong-Bin,KANG Qiang.HEP NP,2002,26(8):876(in Chinese)(张永辉,陈洪斌,康强.高能物理与核物理,2002,26(8):876)6.Dewolf P,Brazel E.Solid State Technology,2000,9:1177.YIN Ming,SUN Xiao-Jun,ZHANG Yu-Lin.Microfabrication Technology,1999,17(1):39(in Chinese)(尹明,孙晓军,张玉林.微细加工技术,1999,17(1):39)

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YIN Ming and SUN Xiao-Jun. Studies on Cockcroft-Walton Accelerator for Narrow E-Beam Lithography[J]. Chinese Physics C, 2004, 28(3): 304-307.

YIN Ming and SUN Xiao-Jun. Studies on Cockcroft-Walton Accelerator for Narrow E-Beam Lithography[J]. Chinese Physics C, 2004, 28(3): 304-307. shu

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Received: 2003-04-30
Revised: 1900-01-01

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沈阳化工大学材料科学与工程学院沈阳 110142

Studies on Cockcroft-Walton Accelerator for Narrow E-Beam Lithography

YIN Ming ^,
SUN Xiao-Jun

Corresponding author: YIN Ming,

E-Beam Laboratory of Shandong University,Ji′nan 250061,China

Received Date: 2003-04-30
Accepted Date: 1900-01-01
Available Online: 2004-03-05

Abstract: For the use of narrow E-beam lithography, the Cockcroft-Walton accelerator is often required. Electrons from the gun will be accelerated by a high voltage and reached a target via electric focusing lenses and bends. To have a high quality narrow E-beam, the noise suppression for the accelerating voltage is one of the key issues. It is verified by our experiments on SDS-3 e-beam lithography machine. The system supplies analog current to the accelerator's tuning circuit, which is proportional to the input voltage. The compensation amplifier consists of main amplifier and an auxiliary one. The auxiliary amplifier reduces input offset drift on output of the main one. The general design project of a combined regulation type for the Cockcroft-Walton accelerator was described. The key technical measures for obtaining a high accelerating stability were introduced. By filtering the noise from the final output of the machine, an output voltage with high stability was obtained, and hence the pattern quality and the line resolution of the mask were improved.