Emittance Measurement of Highly Charged Ion Beams Extracted from ECR Ion Source Using Electric Sweep Scanner

  • We have designed and built an emittance scanner which was installed at the beam line LECR3 of the heavy Ion Accelerator Facility in Lanzhou.The scanner measures the emittance of beams from the ECR ion source by the electric-sweep method,named as Electric-Sweep Scanner(ESS).From analyzing the measured results we found it is contrary to the behavior expected from normal theory of ECR plasma.Typical results are as follows:when the extracted voltage is 15.97kV,total current is 190μA,the horizontal and vertical emittance of O4+ are 137πmm·mrad and 120πmm·mrad respectively.
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  • [1] . Paul W Allison, Joseph D Sherman, David B Holtkamp. An EmittanceScanner For Int ense Low-Energy Ion Beams. IEEE Transact ions on Nuc-lear Science, 1983, 30( 4) : 22042. SUN Liang-Ting, ZHANG Zi-Ming,ZHAO Hong-Wei et al .Nuclear Tech-nology, 2002, 25(9) : 1-5(in Chinese)(孙良亭,张子民,赵红卫等.核技术,2002,25(9):1-5)3. Septier. Appl ied Recharged Particle Opt ics( Volume 1) . Beijing: Atomic Energy Press, 1987. 122-124(in Chinese)(赛普蒂.应用带电粒子光学(第1卷).北京:原子能出版社,1987.122-124)4. ZHANG Hua-Shun. Ion Sources. Beijing: Science Press, 1999. 4375. Leitner M A, Wutte D C,Lyneis C M. Design of the Extraction System ofthe Superconduct ing ECR Ion Source Venus. Luccio A, MacKay W. Proceeding of the 2001 Particl e Accelerator Conf erence.USA, Chicago: IEEEComputer Society Press, 2001. 67-696. Yamashita Y, Isoya Y, Sekiguchi M. Emitt ance Measurement at a 14GHzECR Ion Source(HyperECR) . Proceedings of the 11th Internat ional Con-ference on ECR Ion Source. Netherlands, 1993. 240-2447. Wutte D C,LeitnerM A,Lyneis C M. Physica Scripta, 2001, T92: 247-2498. WANG Chang-Li. Designs and Applicat ions of Industrial Control ComputerSystem. Beijing: Publishing House of Electronics Industry, 1993(in Chinese)(王常力.工业控制计算机系统设计与应用.北京:电子工业出版社,1993)
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CAO Yun, MA Lei, ZHAO Hong-Wei, ZHANG Zi-Min, SUN Liang-Ting, LI Jing-Yu, FENG Yu-Cheng and LI Xi-Xia. Emittance Measurement of Highly Charged Ion Beams Extracted from ECR Ion Source Using Electric Sweep Scanner[J]. Chinese Physics C, 2004, 28(8): 885-888.
CAO Yun, MA Lei, ZHAO Hong-Wei, ZHANG Zi-Min, SUN Liang-Ting, LI Jing-Yu, FENG Yu-Cheng and LI Xi-Xia. Emittance Measurement of Highly Charged Ion Beams Extracted from ECR Ion Source Using Electric Sweep Scanner[J]. Chinese Physics C, 2004, 28(8): 885-888. shu
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Received: 2003-12-08
Revised: 1900-01-01
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Emittance Measurement of Highly Charged Ion Beams Extracted from ECR Ion Source Using Electric Sweep Scanner

    Corresponding author: CAO Yun,
  • Institute of Modern Physics,The Chinese Academy of Sciences,Lanzhou 730000,China

Abstract: We have designed and built an emittance scanner which was installed at the beam line LECR3 of the heavy Ion Accelerator Facility in Lanzhou.The scanner measures the emittance of beams from the ECR ion source by the electric-sweep method,named as Electric-Sweep Scanner(ESS).From analyzing the measured results we found it is contrary to the behavior expected from normal theory of ECR plasma.Typical results are as follows:when the extracted voltage is 15.97kV,total current is 190μA,the horizontal and vertical emittance of O4+ are 137πmm·mrad and 120πmm·mrad respectively.

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