×
近期发现有不法分子冒充我刊与作者联系,借此进行欺诈等不法行为,请广大作者加以鉴别,如遇诈骗行为,请第一时间与我刊编辑部联系确认(《中国物理C》(英文)编辑部电话:010-88235947,010-88236950),并作报警处理。
本刊再次郑重声明:
(1)本刊官方网址为cpc.ihep.ac.cn和https://iopscience.iop.org/journal/1674-1137
(2)本刊采编系统作者中心是投稿的唯一路径,该系统为ScholarOne远程稿件采编系统,仅在本刊投稿网网址(https://mc03.manuscriptcentral.com/cpc)设有登录入口。本刊不接受其他方式的投稿,如打印稿投稿、E-mail信箱投稿等,若以此种方式接收投稿均为假冒。
(3)所有投稿均需经过严格的同行评议、编辑加工后方可发表,本刊不存在所谓的“编辑部内部征稿”。如果有人以“编辑部内部人员”名义帮助作者发稿,并收取发表费用,均为假冒。
                  
《中国物理C》(英文)编辑部
2024年10月30日

Researches on Thermal Emittance of Metal Cathode in Photoinjectors

  • Theoretical analysis of thermal emittance of photoinjectors is presented in this paper.Thermal emittance of metal photo-cathode mainly consists of two parts.One is due to thermal emittance of ideal flat metal cathode,and the other is due to surface roughness.To analyze the former part of the thermal emittance,a new model for the electron distribution emitted from the photocathode is presented,and a formula of the thermal emittance of an idea flat cathode is derived according to this model,which is ε n,rms,flat=R2·hυ-3m 0c2.As to the influence on the thermal emittance from the roughness of the cathode,we also give the analy-tical results with a simplified model.Surface profile measurement of Copper and Magnesium after diamond cutting shows normalized RMS thermal emittance due to surface roughness is about 0.4mm·mrad.Thermal emittance expressions analytical given in this paper can explain some of the existing experimental results very well.
  • 加载中
  • [1] . Lcls Design Group.Lcls Conceptual Design Report2. TESLA Design Group. TESLA Conceptual Design Report3. Recommendations of Basic Energy Sciences Advisory Committee (BES-AC) Panel on Novel ,Coherent Light Sources. http ://www. er. doe. gov/production/bes/BESAC/pubs. html4. Schoenlein R W et al . Science ,1996 ,274 :236 —2385. Yorozu M et al . Jpn. J . Appl . Phys. ,2001 ,40 :4228 —42326. HUANG Wen-Hui ,HE Xiao-Zhong et al . HEPNP ,2004 ,28(4) :304 (in Chinese)(黄文会,何小中等. 高能物理与核物理,2004 ,28(4) :304)7. Batchelor K,Farrell J P ,Dudnikova G. A High Current ,High Gradient ,Laser Excited ,Pulsed Electron Gun. Proceeding of EPAC 988. de Loos M J ,van der Geer S B , Kiewiet F B et al . A High-Brightness Pre-accelerated RF-photo Injector. Proceeding of EPAC 20029. Clendenin J E ,Mulhollan G A , High Quantum Yield ,Low Emittance Electron Sources. SLAC-PUB-7760 ,199810. Palmer D T. The Next Generation Photoinjector. Doctor Thesis ,199811. Wang X J ,Babzien M,Malone R et al . Mg Cathode and Its ThermalEmittance. Proceeding of LINAC 200212. Graves W S ,DiMauro L F ,Heese R et al . Thermal Emittance Measurement of Copper Cathode. PAC 200113. Bluem H ,Cole M D ,Todd A M M et al . Photocathode Electron SourceDevelopment at Advanced Energy Systems. Proceeding of EPAC 200214. Bradley D J ,Allenson M B , Holeman B R. The Transverse Energy of Electrons Emitted from GaAs Photocathodes. J . Phys. D:Appl . Phys. ,1997 ,10 :111—125
  • 加载中

Get Citation
HE Xiao-Zhong, TANG Chuan-Xiang, HUANG Wen-Hui and LIN Yu-Zheng. Researches on Thermal Emittance of Metal Cathode in Photoinjectors[J]. Chinese Physics C, 2004, 28(9): 1007-1012.
HE Xiao-Zhong, TANG Chuan-Xiang, HUANG Wen-Hui and LIN Yu-Zheng. Researches on Thermal Emittance of Metal Cathode in Photoinjectors[J]. Chinese Physics C, 2004, 28(9): 1007-1012. shu
Milestone
Received: 2004-03-24
Revised: 1900-01-01
Article Metric

Article Views(3231)
PDF Downloads(594)
Cited by(0)
Policy on re-use
To reuse of subscription content published by CPC, the users need to request permission from CPC, unless the content was published under an Open Access license which automatically permits that type of reuse.
通讯作者: 陈斌, bchen63@163.com
  • 1. 

    沈阳化工大学材料科学与工程学院 沈阳 110142

  1. 本站搜索
  2. 百度学术搜索
  3. 万方数据库搜索
  4. CNKI搜索

Email This Article

Title:
Email:

Researches on Thermal Emittance of Metal Cathode in Photoinjectors

    Corresponding author: HE Xiao-Zhong,
  • Department of Engineering Physics,Tsinghua University,Beijing 100084,China

Abstract: Theoretical analysis of thermal emittance of photoinjectors is presented in this paper.Thermal emittance of metal photo-cathode mainly consists of two parts.One is due to thermal emittance of ideal flat metal cathode,and the other is due to surface roughness.To analyze the former part of the thermal emittance,a new model for the electron distribution emitted from the photocathode is presented,and a formula of the thermal emittance of an idea flat cathode is derived according to this model,which is ε n,rms,flat=R2·hυ-3m 0c2.As to the influence on the thermal emittance from the roughness of the cathode,we also give the analy-tical results with a simplified model.Surface profile measurement of Copper and Magnesium after diamond cutting shows normalized RMS thermal emittance due to surface roughness is about 0.4mm·mrad.Thermal emittance expressions analytical given in this paper can explain some of the existing experimental results very well.

    HTML

Reference (1)

目录

/

DownLoad:  Full-Size Img  PowerPoint
Return
Return