Slow highly charged ion O4+ induced electron emission from clean solid surfaces

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XU Zhong-Feng, ZHAO Yong-Tao, WANG Yu-Yu, ZHAO Di, WANG Jian-Guo, LI De-Hui, Qayyum Abdul, LI Fu-Li and XIAO Guo-Qing. Slow highly charged ion O4+ induced electron emission from clean solid surfaces[J]. Chinese Physics C, 2008, 32(S2): 247-250.
XU Zhong-Feng, ZHAO Yong-Tao, WANG Yu-Yu, ZHAO Di, WANG Jian-Guo, LI De-Hui, Qayyum Abdul, LI Fu-Li and XIAO Guo-Qing. Slow highly charged ion O4+ induced electron emission from clean solid surfaces[J]. Chinese Physics C, 2008, 32(S2): 247-250. shu
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Received: 2008-07-17
Revised: 1900-01-01
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Slow highly charged ion O4+ induced electron emission from clean solid surfaces

    Corresponding author: XU Zhong-Feng,

Abstract: The total electron emission yields following the interaction of slow highly charged ions (SHCI) O4+ with different material surfaces (W, Au, Si and SiO2) have been measured. It is found that the electron emission yield γ increases proportionally with the projectile velocity v ranging from 5.36×105m/s to 10.7× 105m/s. The total emission yield is dependent on the target materials, and it turns out to follow the relationship γ(Au)>γ(Si)>γ(W). The result shows that the electron emission yields are mainly determined by the electron stopping power of the target when the projectile potential energy is taken as a constant, which is in good agreement with the former studies.

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