Slow highly charged ion O4+ induced electron emission from clean solid surfaces
- Received Date: 2008-07-17
- Accepted Date: 1900-01-01
- Available Online: 2008-01-03
Abstract: The total electron emission yields following the interaction of slow highly charged ions (SHCI) O4+ with different material surfaces (W, Au, Si and SiO2) have been measured. It is found that the electron emission yield γ increases proportionally with the projectile velocity v ranging from 5.36×105m/s to 10.7× 105m/s. The total emission yield is dependent on the target materials, and it turns out to follow the relationship γ(Au)>γ(Si)>γ(W). The result shows that the electron emission yields are mainly determined by the electron stopping power of the target when the projectile potential energy is taken as a constant, which is in good agreement with the former studies.