×
近期发现有不法分子冒充我刊与作者联系,借此进行欺诈等不法行为,请广大作者加以鉴别,如遇诈骗行为,请第一时间与我刊编辑部联系确认(《中国物理C》(英文)编辑部电话:010-88235947,010-88236950),并作报警处理。
本刊再次郑重声明:
(1)本刊官方网址为cpc.ihep.ac.cn和https://iopscience.iop.org/journal/1674-1137
(2)本刊采编系统作者中心是投稿的唯一路径,该系统为ScholarOne远程稿件采编系统,仅在本刊投稿网网址(https://mc03.manuscriptcentral.com/cpc)设有登录入口。本刊不接受其他方式的投稿,如打印稿投稿、E-mail信箱投稿等,若以此种方式接收投稿均为假冒。
(3)所有投稿均需经过严格的同行评议、编辑加工后方可发表,本刊不存在所谓的“编辑部内部征稿”。如果有人以“编辑部内部人员”名义帮助作者发稿,并收取发表费用,均为假冒。
                  
《中国物理C》(英文)编辑部
2024年10月30日

Raman scattering investigation of C-doped a-SiO2 after high energy heavy ion irradiations

  • Thermally grown amorphous SiO2 films were implanted at room temperature with 100 keV C-ions to 5.0×1017 or 1.2×1018 ions/cm2. These samples were irradiated at room temperature with 853 MeV Pb-ions to 5.0×1011, 1.0×1012, 5.0×1012 ions/cm2, or with 308 MeV Xe-ions to 1.0×1012, 1.0×1013, 1.0×1014 ions/cm2, respectively. Then the samples were investigated using micro-Raman spectroscopy. From the obtained Raman spectra, we deduced that Si--C bonds and sp2 carbon sites were created and nano-inclusions may also be produced in the heavy ion irradiated C-doped SiO2. Furthermore, some results show that Pb ion irradiations could produce larger size inclusions than Xe ions and the inclusion size decreased with increasing the irradiation fluence. The possible modification process of C-doped a-SiO2 under swift heavy ion irradiations was briefly discussed.
      PCAS:
  • 加载中
  • [1] Zacharias M, Christen J, Basing J et al. J. Non-Cryst. Soli., 1996, 115: 1982 WANG Z G, JIN Y F, XIE E Q et al. Nucl. Instrum. Methods B, 2002, 193: 6853 YU Y H, WONG S P, Wilson I H. Phys. Stat. Sol. A, 1998, 168: 5314 Pérez-Rodríguez A, Gozález-Varona O, Garrido B et al. J. Appl. Phys., 2003, 94: 2545 Garrido B, López M, FerréS et al. Nucl. Instrum. Methods B, 1996, 120: 1016 ZHAO J, MAO D S, LIN Z X et al. Appl. Phys. Lett., 1998, 73: 18387 WANG Z G, JIN Y F, XIE E Q et al. Nucl. Instrum. Methods B, 2003, 209: 2008 WANG Z G, ZHAO Z M, Benyagoub A et al. Nucl. Instrum. Methods B, 2007, 256: 2889 Neri F, Trusso S, Vasi C et al. Thin Solid Films, 1998, 332: 29010 Moura C, Cunha L, Hórfo et al. Surf. Coat. Tech., 2003, 174-175: 32411 Dimitrov D B, Papadimitriou D, Beshkov G. Diam. Relat. Mater., 1999, 8: 114812 HU Z H, LIAO X B, DIAO H W et al. J. Cryst. Growth, 2004, 264: 713 Veresa M, Koósa T M, Tóth S et al. Diam. Relat. Mater., 2005, 14: 105114 Beeman D, Silverman J, Lynds R et al. Phys. Rev. B, 1984, 30: 87015 Dillon R O, Woollam J A. Phys. Rev. B, 1984, 29(6): 348216 Ferrari A C, Rodil S E, Robertson J. Phys. Rev. B, 2003, 67: 15530617 Ferrari A C, Robertson J. Phys. Rev. B, 2000, 61: 1409518 LIU C B, WANG Z G , ZANG H et al. Chinese Physics C (HEP NP), 2008, 32(S2): 251
  • 加载中

Get Citation
LIU Chun-Bao and WANG Zhi-Guang. Raman scattering investigation of C-doped a-SiO2 after high energy heavy ion irradiations[J]. Chinese Physics C, 2011, 35(9): 885-889. doi: 10.1088/1674-1137/35/9/019
LIU Chun-Bao and WANG Zhi-Guang. Raman scattering investigation of C-doped a-SiO2 after high energy heavy ion irradiations[J]. Chinese Physics C, 2011, 35(9): 885-889.  doi: 10.1088/1674-1137/35/9/019 shu
Milestone
Received: 2011-02-12
Revised: 2011-02-02
Article Metric

Article Views(2359)
PDF Downloads(442)
Cited by(0)
Policy on re-use
To reuse of subscription content published by CPC, the users need to request permission from CPC, unless the content was published under an Open Access license which automatically permits that type of reuse.
通讯作者: 陈斌, bchen63@163.com
  • 1. 

    沈阳化工大学材料科学与工程学院 沈阳 110142

  1. 本站搜索
  2. 百度学术搜索
  3. 万方数据库搜索
  4. CNKI搜索

Email This Article

Title:
Email:

Raman scattering investigation of C-doped a-SiO2 after high energy heavy ion irradiations

    Corresponding author: LIU Chun-Bao,
    Corresponding author: WANG Zhi-Guang,

Abstract: Thermally grown amorphous SiO2 films were implanted at room temperature with 100 keV C-ions to 5.0×1017 or 1.2×1018 ions/cm2. These samples were irradiated at room temperature with 853 MeV Pb-ions to 5.0×1011, 1.0×1012, 5.0×1012 ions/cm2, or with 308 MeV Xe-ions to 1.0×1012, 1.0×1013, 1.0×1014 ions/cm2, respectively. Then the samples were investigated using micro-Raman spectroscopy. From the obtained Raman spectra, we deduced that Si--C bonds and sp2 carbon sites were created and nano-inclusions may also be produced in the heavy ion irradiated C-doped SiO2. Furthermore, some results show that Pb ion irradiations could produce larger size inclusions than Xe ions and the inclusion size decreased with increasing the irradiation fluence. The possible modification process of C-doped a-SiO2 under swift heavy ion irradiations was briefly discussed.

    HTML

Reference (1)

目录

/

DownLoad:  Full-Size Img  PowerPoint
Return
Return