Studies on Wehnelt of Electron-Beam Accelerator

  • Electron beam can be focused into a small spot with the diameter of only about nanometers theoretically,and easily controlled.It cannot be replaced by any other micro fabrication techniques in mask-making of VLSI (Very Large-Scale Integration).Based on the electron gun of SDS-3 electron beam lithography machine,the concave hyperboloid Wehnelt(oxide-coated cover)of accelerator is discussed.The electron trajectories and potential distribution are given.Electrons from the gun accelerated by a high voltage reached a target of silicon piece(In front of the aperture)via the Wehnelt.Finally,spots of E-beam in the silicon piece and the geometry schematics for Wehnelt of accelerator are given.
  • 加载中
  • [1] . YIN Ming, SUN Xiao-jun. HEP NP, 2004, 28( 4) : 304 -307(in Chinese)(尹明,孙晓军,高能物理与核物理,2004, 28(4):304-307)2. WANG Jun-Hua, SHEN Lian-Guan, WANG Gui-Cheng et al . HEP NP, 2001, 25( 11) : 1120-1127 (in Chinese)(王绮华,沈连官,王贵诚等,高能物理与核物理,2001,25(11):1120-1127 )3. Yamagat e Y, Mihara S, Nishioki N. IEEE MEMS, 1996, 48: 307-3114. Dewolf P, Brazel E. Sol id Stat e Technology, 2000, 38( 9) : 117-1255. Bakharaen A A, Nurgazizon N I. Surface Science, 2001, 482-485:1319. 13246. ZHANG Yong-Hui , CHEN Hong-Bin, KANG Qiang.HEP NP, 2002,26( 8) : 876-879(in Chinese)(张永辉,陈洪斌,康强.高能物理与核物理, 2002, 26 ( 8 ) : 876-879)7. WANG Shu-Hong, WANG Jiu-Qing, YE Qiang. HEP NP, 2002, 26( 12) : 1302(in Chinese)(王书鸿,王九庆,叶强.高能物理rJJ核物理,2002,26(12):1302)8. Pfeiffer H C. Vac Sci Technology, 1999, B17( 11/ 12) : 2566-25769. Fritz. Sience, 2000, 288: 316-32210. Wada Y. Microelectronics, 1998, 29: 601-61111. YIN Ming, ZHANG Yu-lin. Acta Optica Sinica, 2004, 24 ( 3) : 423-426 (in Chinese)(尹明,张玉林.光学学报,2004,24(3):423-426 )
  • 加载中

Get Citation
YIN Ming and ZHOU Xiao-Yan. Studies on Wehnelt of Electron-Beam Accelerator[J]. Chinese Physics C, 2005, 29(3): 301-304.
YIN Ming and ZHOU Xiao-Yan. Studies on Wehnelt of Electron-Beam Accelerator[J]. Chinese Physics C, 2005, 29(3): 301-304. shu
Milestone
Received: 2004-06-21
Revised: 1900-01-01
Article Metric

Article Views(2682)
PDF Downloads(599)
Cited by(0)
Policy on re-use
To reuse of subscription content published by CPC, the users need to request permission from CPC, unless the content was published under an Open Access license which automatically permits that type of reuse.
通讯作者: 陈斌, bchen63@163.com
  • 1. 

    沈阳化工大学材料科学与工程学院 沈阳 110142

  1. 本站搜索
  2. 百度学术搜索
  3. 万方数据库搜索
  4. CNKI搜索

Email This Article

Title:
Email:

Studies on Wehnelt of Electron-Beam Accelerator

    Corresponding author: YIN Ming,
  • School of Control Science and Engineering,Electron-Beam Laboratory,Shandong University,Jinan 250061,China2 School of Information Science and Engineering,Shandong University,Jinan 250061,China

Abstract: Electron beam can be focused into a small spot with the diameter of only about nanometers theoretically,and easily controlled.It cannot be replaced by any other micro fabrication techniques in mask-making of VLSI (Very Large-Scale Integration).Based on the electron gun of SDS-3 electron beam lithography machine,the concave hyperboloid Wehnelt(oxide-coated cover)of accelerator is discussed.The electron trajectories and potential distribution are given.Electrons from the gun accelerated by a high voltage reached a target of silicon piece(In front of the aperture)via the Wehnelt.Finally,spots of E-beam in the silicon piece and the geometry schematics for Wehnelt of accelerator are given.

    HTML

Reference (1)

目录

/

DownLoad:  Full-Size Img  PowerPoint
Return
Return