×
近期发现有不法分子冒充我刊与作者联系,借此进行欺诈等不法行为,请广大作者加以鉴别,如遇诈骗行为,请第一时间与我刊编辑部联系确认(《中国物理C》(英文)编辑部电话:010-88235947,010-88236950),并作报警处理。
本刊再次郑重声明:
(1)本刊官方网址为cpc.ihep.ac.cn和https://iopscience.iop.org/journal/1674-1137
(2)本刊采编系统作者中心是投稿的唯一路径,该系统为ScholarOne远程稿件采编系统,仅在本刊投稿网网址(https://mc03.manuscriptcentral.com/cpc)设有登录入口。本刊不接受其他方式的投稿,如打印稿投稿、E-mail信箱投稿等,若以此种方式接收投稿均为假冒。
(3)所有投稿均需经过严格的同行评议、编辑加工后方可发表,本刊不存在所谓的“编辑部内部征稿”。如果有人以“编辑部内部人员”名义帮助作者发稿,并收取发表费用,均为假冒。
                  
《中国物理C》(英文)编辑部
2024年10月30日

Applications of Highly Ionized Ion Beams (abstract only)

Get Citation
J.P.Briand. Applications of Highly Ionized Ion Beams (abstract only)[J]. Chinese Physics C, 2007, 31(S1): 236-236.
J.P.Briand. Applications of Highly Ionized Ion Beams (abstract only)[J]. Chinese Physics C, 2007, 31(S1): 236-236. shu
Milestone
Received: 2007-05-30
Revised: 1900-01-01
Article Metric

Article Views(2765)
PDF Downloads(525)
Cited by(0)
Policy on re-use
To reuse of subscription content published by CPC, the users need to request permission from CPC, unless the content was published under an Open Access license which automatically permits that type of reuse.
通讯作者: 陈斌, bchen63@163.com
  • 1. 

    沈阳化工大学材料科学与工程学院 沈阳 110142

  1. 本站搜索
  2. 百度学术搜索
  3. 万方数据库搜索
  4. CNKI搜索

Email This Article

Title:
Email:

Applications of Highly Ionized Ion Beams (abstract only)

    Corresponding author: J.P.Briand,
  • Ion Surface Advanced Processes, 2 Square F. Couperin, 92160 Antony, FranceBerkeley Ion Equipments, Inc.1171 S. Springer Road; Los Altos, CA 94024, FranceUniversité P. et M. Curie, 4 Place Jussieu, 75252 CEDEX 05 Paris, France

Abstract: The ECR ion sources have mainly been used until now for injection of cyclotrons and a large number of these sources are presently in operation through the world. Most cyclotrons are used today for nuclear physics researches but an increasing number of these accelerators are now devoted to medical applications. The ECR ion sources have also been extensively used for producing low energy beams for academic researches in atomic and surface physics. These studies led to very encouraging results opening the way to industrial applications. In this talk some of the most promising applications of HCI beams will be reviewed. The development of these applications will require some important improvements of the ECR sources which will be discussed. A special emphasis will be given to the respective roles of ECR and EBIS ion sources in these industrial applications, and some economic and market considerations discussed.

    HTML

目录

/

DownLoad:  Full-Size Img  PowerPoint
Return
Return