-
[1]
. CHEN F F, Boswell R W. IEEE Transactions on PlasmaScience, 1997, 25(6): 12452. CHEN F F. Plasma Physics and Controlled Fusion, 1991,33(4): 3393. Arnush D, CHEN F F. Physics of Plasmas, 1998, 5(5): 12394. Scime E E, Keesee A M, Boswell R W. Physics of Plasmas,2008, 15(5): 0583015. Squirea J P, Chang-Díaza F R, Glover T W et al. ThinSolid Films, 2006, 506-507: 5796. Mordyk S, Miroshnichenko V, Shulha D. Rev. Sci. Instrum.,2008, 79(2): 02B7077. Shamrai P Konstantin, Taranov B Vladimir. PlasmaSources Sci. Technol., 1996, 5: 4748. Lorenz B, Krmer M, Selenin V L et al. Plasma SourcesSci. Technol., 2005, 14(3): 6239. Miljak David G, CHEN F F. Plasma Sources Sci. Technol.,1998, 7: 6110. Alton G D, Bilheux H. HEP NP, 2007, 31(Supp.1): 201(in Chinese)11. XU G S, WAN B N. Plasma Science Technology, 2006,8(1): 10