Application of stratified implantation for silicon micro-strip detectors

[1]
Foad M, Jennings D. Solid State Technology, 1998, 41: 43[2] Wolf S, Tauber R. Silicon Processing for the VLSI Era. Second edition. Sunset Branch, California. 2000, 325[3] Rimini E. Ion Implantation: Basics to Device Fabrication. Boston, Kluwer. 1995, 79[4] El-Kareh B. Fundamentals of Semiconductor Processing Technologies. Boston, Kluwer. 1995, 381[5] Romig T, McManus J, Olander K, Kirk R. Solid State Technology, 1996, 39: 69[6] Mack M. Wafer Cooling and Wafer Charging in Ion Implantation. Amsterdam, Elsevier. 1992, 613[7] Simonton R, Tasch A. Channeling Effects in Ion Implantation. Amsterdam, Elsevier. 1992, 206[8] LI Hai-Xia, LI Zhan-Kui, WANG Fang-Cong et al. Chinese Physics C, 2011, 35(7): 635[9] Sze S M. Physics of Semiconductor Devices. Third edition. Hsinchu, Taiwan: A JOHN WILEY SONS, inc., 1987. 95